Dry Asher Etcher RIE ICP Equipment > Lam Research 4520/4420 Rainbow Oxide Etcher
Please contact us by http://www.globalnanotechequipment.com sales@globalnanotechequipment.com for more information.
Manufacturer:Lam Research
Condition:Refurbished to OEM SPEC (Installation and warranty are optional)
Price:Contact Us Now
Location:California,USA
Amount: 6 sets
Description for reference only(One of the unit).
* Configured for 6" wafers
* Classic control system
* Bulkhead mount system
* Momentary EMO
* Hine 38A open cassette SEND indexer
* Belt driven load station
* Standard load station shuttle spatula
* 6-gas box configuration
* Standard gas box
* Rear gas panel exhaust
* [5Ra] gas weldment polish
* Unit mass flow controllers
Gas 1: Ar (1 slm)
Gas 2: CF4 (50 sccm)
Gas 3: CHF3 (50 sccm)
Gas 4: He (1 slm)
Gas 5: Ar (200 sccm)
Gas 6: N2 (100 sccm)
UPC: He (50 sccm)
* AC input box (fuses)
* 400 Khz RF power frequency
* AE PDW-2200 RF generator on cart
* 6" entrance loadlock wafer holder (Tight-pocket)
* Variable upper chamber gap
* LoFAT RF power tuning
* Silicon upper chamber electrode
* 6" lower chamber electrode (Non-ESC)
* TAC for lower chamber wafer clamping
* Single chamber monochromators
* Non-heated endpoint window
* Low pressure chamber manifolding
* HPS valve for chamber isolation
* AC-2 chamber pressure control
* 10 Torr chamber manometer
* 10 Torr wafer area pressure manometer
* 100 Torr backside He manometer
* 6" exit loadlock wafer holder
* Hine 38A RECEIVE indexer
* 3-light Light Tower
Please also refer to Lam Research 4420 Rainbow Nitride Poly Etcher;Lam Research AutoEtch 590 Oxide Etcher;Lam Research AutoEtch 590 Oxide Etcher;Lam Research AutoEtch 490 Nitride Poly EtcherPlease contact us by http://www.globalnanotechequipment.com sales@globalnanotechequipment.com for more information.
Specification
Dry Asher Etcher RIE ICP Equipment > Lam Research 4520/4420 Rainbow Oxide Etcher
